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Quantitative Electron Diffraction from Thin Films

Published online by Cambridge University Press:  29 November 2013

M.G. Lagally  and
D.E. Savage
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The structure and morphology of a thin film is, apart from composition, probably its most significant feature. Again and again we find that electronic, chemical, mechanical, magnetic, optical, and superconducting properties depend on the arrangement of atoms and on disorder in this arrangement. As most thin films are created using some form of deposition technique in which atoms are brought together at a surface, it is at the surface that the first opportunity occurs for formation of a particular atomic structure and morphology. As deposition proceeds, a moving surface, the “growth front,” continues to serve as the template for structure formation. Various kinetic processes, such as atomic transport and the adsorption or desorption of atoms from already-formed structures, determine the final morphology of the film. Subsequent treatment can, of course, modify the structure and morphology, but clearly the initial events occurring at the surface influence, to a large measure, the final outcome.

Techniques sensitive to surface structure and morphology are therefore an important component in the toolbox of methods for the quantitative analysis of the properties of thin films. Electron diffraction techniques have been, and continue to be, the most powerful and versatile of these. Even though electron diffraction is also useful for the structural analysis of the bulk, when one speaks of electron diffraction in the context of thin films, one almost invariably refers to surface-sensitive diffraction. Other methods, in particular scanning probe microscopy, have recently become popular. In many cases, such methods serve to re-emphasize the value of electron diffraction for quantitative structural analysis of thin films.

Type
Quantitative Analysis of Thin Films
Information
MRS Bulletin , Volume 18 , Issue 1 , January 1993 , pp. 24 - 31
Copyright
Copyright © Materials Research Society 1993

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References

1. For an overview of surface diffraction methods, see Lagally, M.G., “Diffraction Techniques,” Chapter 5 in Methods of Experimental Physics, Vol. 223, Surfaces, edited by Park, R.L. and Lagally, M.G. (Academic Press, Orlando, Florida, 1985). See also, Lagally, M.G., “Low-Energy Electron Diffraction” and Savage, D.E., “Reflection High-Energy Electron Diffraction,” respectively Sections 4.5 and 4.6 in Encyclopedia of Materials Characterization, edited by Brundle, C.R., Jr.Evans, C.A., and Wilson, S. (Butterworth, Boston, 1992).Google Scholar
2. For an elementary treatment of interference and diffraction from a one-dimensional grating, see Hecht, E., Optics (Addison-Wesley, Reading, 1987), Chapter 10.Google Scholar
3.Henzler, M. in Electron Spectroscopy for Surface Analysis, edited by Ibach, H. (Springer, Berlin, 1977); Lagally, M.G., in Reflection High-Energy Electron Diffraction and Reflection Electron Imaging from Surfaces, edited by Larsen, P.K. and Dobson, P.J. (Plenum, London, 1989).Google Scholar
4.Savage, D.E. and Lagally, M.G., Electron Spectroscopy for Surface Analysis, edited by Ibach, H. (Springer, Berlin, 1977); Lagally, M.G., in Reflection High-Energy Electron Diffraction and Reflection Electron Imaging from Surfaces, edited by Larsen, P.K. and Dobson, P.J. (Plenum, London, 1989).Google Scholar
5.Däwerwitz, L., Superlattices and Microstructures 9 (1991) p. 141.CrossRefGoogle Scholar
6.Van Hove, M.A., Weinberg, W.H., and Chan, C.-M., Low-Energy Electron Diffraction (Springer, Berlin, 1986).CrossRefGoogle Scholar
7. See, for example, Whaley, G.J. and Cohen, P.I., Appl. Phys. Lett. 57 (1990) p. 144.CrossRefGoogle Scholar
8.Savage, D.E. and Lagally, M.G., J. Vac. Sci. Technol. B 4 (1986) p. 943.CrossRefGoogle Scholar
9.Mo, Y.-W. and Lagally, M.G., J. Cryst. Growth 111 (1991) p. 876. Aumann, C.E., Mo, Y.-W., and Lagally, M.G., Appl. Phys. Lett. 59 (1991) p. 1061.CrossRefGoogle Scholar
10.Pukite, R.R., Van Hove, J.M., and Cohen, P.I., Appl. Phys. Lett. 44 (1984) p. 456.CrossRefGoogle Scholar
11.Aumann, C.E., Savage, D.E., Kariotis, R., and Lagally, M.G., J. Vac. Sci. Technol. A6 (1988) p. 1963.CrossRefGoogle Scholar
12.Joyce, B.A., Neave, J.H., Zhang, J., and Dobson, P.J., in Reflection High-Energy Electron Diffraction and Reflection Electron Imaging of Surfaces, edited by Larsen, P.K. and Dobson, P.J. (Plenum, London, 1989).Google Scholar
13.Lagally, M.G., in Metals Handbook, Vol. 10 (American Society for Metals, Metals Park, Ohio, 1986).Google Scholar